Magnetron Sputter Sources

• Circular Magnetron Sputtering Guns

• Wide Range of Sputtering Targets: Metallic - Insulating, Magnetic - Non-Magnetic

• Rare-Earth NdFeB Permanent Magnets

• Excellent Film Uniformity and Target Utilization

• The shock-absorbing packaging design allows secure shipping and storage
  

Features:

• Quality Construction: The SpinTron series of sputtering guns was designed and manufactured with a focus on details. We use high quality materials of stainless steel and ceramics. The design and selection of components and materials are based on the principles of physics and engineering.

• Enhancement from magnetic assembly: We have used electromagnetic finite element calculations in the design of the permanent magnetic assembly to achieve high field strength and uniform field profile. We use NdFeB rare-earth permanent magnet in every SpinTron product, and offer a true magnetron sputtering tool. The magnet is coated with multiple layers of protective materials against cooling-water induced corrosion for durability.

• Strong coupling with external power: The SpinTron is equipped with a standard electrical RF connector, which matches physically and electronically with a wide range of DC and RF sputtering power supplies. The low impedance sputtering heads are easily interfacible with external power supplies.

• Easy installation and adjustment: The SpinTron can be installed very easily with a standard fitting without the use of special tools. Its position in the vacuum chamber can be adjusted conveniently.

• Easy target change: Change of target is as easy as "123" by firstly placing the target on the anode, then putting on the target cover, and finally, adding on the anode shield. There is no need to adjust the gun to fit targets with different height.

• Versatile sizes: The SpinTron Series consists of 1, 2, 3, 4, 8-inch diameter sputtering heads. Other diameters can be custom made with similar performance as the standard offerings.

• Easy maintenance: The SpinTron is easy to maintain and designed to have a long life time.

• Customer centered services: We warrantee our products against defective parts and poor workmanship. We strive to minimize down-time for the products. We are so confident about the SpinTron that we will provide a loaner for a SpinTron under repair, so that disruption to your business is minimized.
  

High Vacuum Magnetron Sputtering Gun 3-inch	High Vacuum Magnetron Sputtering Gun 2-inch

 

 

 

 

 

 

 

 

 

 

 

 

 

Wide-Range of Applications:

• Film Coating

• Semiconductor Devices

• Spintronic Devices

• Magnetic Recording Media

• Superconducting Films

• Quantum Computing Devices

• MEMS

• Biosensors

• Nanotechnology

• Superlattices

• Granular Films

• Shape Memory Alloys

• Combinatorial Thin Film Deposition

• Thin Film Based Lasers
  

Sputtering Process Equipment	Highest Uniformity Films

Technical Specifications

Sputtering Target:

• Diameter 2.0", 3.0", 4.0"

• Thickness to 1/4" for non-magnetic target to 1/16" for magnetic target

• Utilization up to 30%

• Magnet: NdFeB Rare Earth Magnet
  
  Power:
  

• DC (Max.): 1200 W

• RF (Max.) 800 W

• Sputtering Current: (Max.) 3 Amp

• Sputtering Voltage: 100-1000 V

• Sputtering Pressure: .5-100 mTorr
  
  Cooling Water:
  

• Flow Rate: 1 GPM

• Water Inlet Temperature: <20 C

• Water Tubing: 0.25" O.D.
  
  

 

 

 

 

    Mounting:

• Feedthrough 1" O.D.tube

• Electrical Connector Standard HN type (DC and RF)
  
  Dimension and Weight:
  
  

• Anode Shield Diameter: 4.75"

• Total Length: 15''

• Weight: 12 lbs

 

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C4 Scientific Systems 754 Leona Ln Mountain View, California 94040 Phone: (650) 961-6620 Fax: (650) 961-8591 support@c4scientific.com