New Advanced Thin-Film Monitoring, from ORS

Reflectometry, Interferometry, Film Roughness Measurements
Composition Measurements using Multi-Wavelength
Laser Interferometry for In Situ Monitoring in MBE, CVD, PVD, ALD, PLD, MOCVD, MEMS, OLED, Solar, Nanotechnology
Applications: Film Uniformity, Lattice Strain, Wafer Bow Monitoring (Patent Pending), Surface Particulates, Process Residues
Advanced Optical In situ Monitoring for VCSEL, Failure Analysis, Fault Isolation, Quality Control, Real Time Analysis, GaN Growth
Software Provides Fully Automated, Quantitative Analysis In Real Time, Synchronized With Substrate Rotation
Optical Reference Systems: for In –Situ Process Information
Emissivity Corrected Pyrometer (ECP) Combined With Single- Dual-, Triple Wavelength Reflectometers

EpiEYE and the MiniEYE Hardware Solutions:

Composition Measurements Using Multi-Wavelength Laser Interferometry
Reflectometry, Emissivity Corrected Pyrometry (immune to changes in ambient light)
Wafer-Bow/Strain and Compositional Analysis
Data Acquisition Rates that exceed that of any other In-Situ Tool
Unrivalled Accuracy and Reliability of our Instruments


Hardware Configuration	In-situ Thin-Film Monitoring	Wafer-Bow/Strain and Compositional Analysis

R-Fit and R-Fit LIVE Software Solutions: