Scientific

     

Ion Source IS 40 E1

 

Ion Source IS 40 E1




Product Description:

The IS 40E1 is an extractor type ion source, mounted on a rotatable flange DN 40CF.
The standard working distance from end of source to the sample is 23 mm. The two lens system of the source allows easy changing of the spot size, which is continuously variable. It can be operated over a primary energy range of 0.15 keV to 5 keV. Because of its very slim outline and a housing cone angle of 50° it is ideally suitable for tight environments. The filament is non-line-of-sight to the sample, thereby minimizing contamination from the source. It is field replaceable with non-critical alignment and long lifetime which makes the source serviceable by the user and hence economical. Due to this special cathode type (YttriumOxide coated Ir filament) the operation temperature of the ionizer is considerably lower than for other sources, hence reducing ion beam contamination. Additionally the cathode allows for operation with reactive gases like Oxygen, Hydrogen, and hydrocarbons.


The scanning area is 10x10 mm at the standard working distance of 23 mm. Over this area the sputter crater is extremely homogeneous. This results in precise depth profiles with maximum depth resolution. There are two ports for differential pumping. Usually the first differential pumping stage is linked with the pumping line of the second differential stage via a valve acting as a throttle. The second differential stage is connected to an UHV pumping system. This way the pressure in the analysis chamber can be maintained in the 10-8 mbar range while the source is operating at the specified maximum beam current.

The source can be supplied complete with an UHV gas inlet with leak valve and a differential pumping system.
As an option a Wien Mass Filter for elimination of unwanted isotopes, impurities, multiple charged ions, neutral
particles can be retrofitted to the source.

Mounting Details:


Technical Data:

Ion beam performance:

Operation performance:

Options:

ION SOURCE POWER SUPPLY IS-PS40E


ION SOURCE POWER SUPPLY IS-PS40E:

The Ion Source Power Supply IS-PS40E is dedicated to supply Ion Source IS30-40. Unit delivers all required
voltages for operation of the Ion Source, no additional electronics is needed. The IS-PS40E is designed for Extended Ion Sources IS40E. The power supply allows to modify ion beam profile and position. The ion source can be used for cleaning the sample or scanning with low beam profile at high or low ion energy.

 

Specifications:

 
  Beam Energy: 1 – 5000 eV at max 1mA; Error < 1V; Ripple < 0.2 Vpp
  Filament Current: 3 - 5.5A at max 12V
  Electron ionization current: 10µA – 10mA discrete values; Error < 2%
  Beam Focus: High Voltage Power Supplies for 2 focusing electrodes
1V - 5000V at max 1mA, Error < 1V; Ripple <0.2Vpp
  Beam Deflection: ± 650V for X and Y deflection plates
  Scanning: Scanning area: 0 - 100% of max deflection
TPD (time per dot): 20µs -10ms
  Degas: Degas controlled with internal timer
  User Interface: LCD graphic display 128 x 240 dots, functions keys and
4 digital encoders for editing simultaneously and precisely all
needed parameters
Several settings of process parameters can be stored and recalled
  Communication: 2 wire EIA-485 for control all parameters by external computer
  Communication Interfaces (option): EIA-232, 2 wire EIA-485, 4 wire EIA-485
  Dimensions (W x H x D): 483 x 133 x 500 mm

 

Other Ion Sources:

 

 


C4 Scientific Systems
754 Leona Ln
Mountain View, California 94040
Phone: (650) 961-6620
Fax: (650) 961-8591
support@c4scientific.com