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The Electron Source ES 40 C1
The Electron Source ES 40 C1 is a scanable electron source with small spot profile.
- High electron current
- Wide energy range
- Small spot size
- Integrated beam deflection
The Electron Source ES 40C1 is a scanable electron source with small spot profile. Due to the high transmission of its Einzel Lens, the ES 40C is an electron source which gives high electron beam current over a wide energy range. The source can be adapted to a customer requirements regarding the insertion depth and the source shielding material (µ-metal or copper). The ES 40C1 is designed for a stable and reliable operation in such applications like: AES, scanning applications, imaging, EELS and electron pulse or desorption experiments.
Main features:
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Energy range 20 eV - 5 keV
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Energy width < 1 eV
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Sample current up to 200 µA
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Scan area 10 x 10 mm²
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Mu-metal shielding
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Hair pin cathode
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Insertion depth: 154mm, OD: 34.4 mm
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Mounting flange: 2.75"OD (NW38CF)
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Maximum Bakeout Temperature: 250°C
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Customized insertion depth
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Cu-shielding for mu-metal chamber mounting
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Fine focus microformed tip cathode
Power Unit ES-PS40C
The ES-PS40C is equipped with: Electron Emission Controller and Extractor Units provides heating for the cathode, extracting the electrons and keeping emission current at desired level. Energy and Focus High Voltage Units allow to set electron beam energy and focusing the beam. Deflection unit allows to set beam position on the sample.
All required
voltages are supplied to Electron Source with one high voltage plug. User Interface
contains a large letters LCD display (2 x 20 chars), function keys and digital
encoder to control precisely all parameters which can be stored and recalled.
The last stored parameters are recalled after switch on the unit. The process
parameters can be controlled by the computer through the RS-485 communication
interface and dedicated application. The ES-PS40C is mounted in the 19”
rack (full-width, 3 units height) or free standing.
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Specifications: |
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| Beam Energy: | 0 – 5000 eV at max 1mA; Error < 1V; Ripple < 0.2 Vpp | |
| Filament current: | 1 - 2.2A at max 10V | |
| Electron Current : | 1µA – 1mA ; Error < 2% | |
| Beam Focus: | 1V - 5000V at max 1mA,Error < 1V; Ripple <0,2Vpp | |
| Beam Deflection: | ± 650V for X and Y deflection plates | |
| User Interface: | LCD
text display 2 x 20 chars with Functions keys Suitable digital encoder for editing precisely all parameters A set of process parameters can be stored and recalled |
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| Communication: | 2 wire EIA-485 for control all parameters by external computer | |
| Communication Interfaces (option): | EIA-232, 2 wire EIA-485, 4 wire EIA-485 | |
| Dimensions (W x H x D): | 483 x 133 x 350 mm | |