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New UHV - Sputter Thin Film Deposition System
for Magnetic Materials, Dieletrics,
Compound Semiconductors, Nano Fabrication, MEMS, Packaging - from Mustang
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Complete UHV Sputter Processing and and Thin Film Deposition System for Research and Production Applications
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Vacuum Deposion System with Unsurpassed UHV Vacuum Conditions and Ultimate Purity
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Magnetron Sputter Cathode Assembly with DC-, Pulsed-DC, RF Power, Magnetic or NonMagnetic Materials, Reactive Sputtering
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E-Beam Deposition, Multi-Pocket E-Guns, Thermal Evaporators with PID-Controllers for absolute Temperature Stability and Uniformity
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Automatic System Control for Multiple Wafer Deposition, Cleanroom Approved, ISO Quality Management Manufacturing
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Very Accurate Beam Flux Control with Thin Film Deposition Monitor System, Quartz Crystal Microbalance Array
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Mustang Vac's Colt 48® Sputter System
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Mustang VMS 1000 & 1500 Coating Systems
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Compact Design, Easy Operation, Multi Function Use
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2-, 3-, 4- UHV Sputter Targets with optimized magnet system for ferromagnetic materials
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Computer Controlled DC-Power Supply, DC-Pulser, RF-Generator
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Fully Automated Gas Supply with Mass Flow Control Multi-Channel System and Electro-Pneumatic Valve Control Module
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Unique Co-Deposition for Multiple Materials and Rapid Substrate Processing
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Specimen Doping, Motorized Metal Deposition, Mask Aligner and Patterning
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2"-,4"-,6"-,8"- Substrate Multi-Sample Handling System, with Cooled Source and Substrate Shutter
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Beam Flux Monitor, Quartz Crystal Microbalance, Residual Gas Analaysis, RHEED, Pyrometry, Ellipsometry
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Glove Box Connection for fast Sample Entry Load Lock Station, Etching amd Preparation Chamber, Vacuum Suitcase
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Future Upgrades and Add-On's, Expasion to Multi-Chamber System with Surface Analysis Capabilities
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Optical Coating System
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Fully Automated Machine Operation
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High-Speed Batch Metallizers
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