
Load lock chamber:
Diameter: 100 mm - 2 stage sample manipulator
Radiation heater for water vapour desorption
Diameter: 250 mm
4 stage sample manipulator
Substrate heater, Tmax. = 1100 °C (oxygen desorption)
Pumping equipment: ion pump + Ti sublimation pump
Growth chamber:
Diameter: 450 mm, LN2 cryopanel
X,Y,Z sample manipulator, motorized rotation - substrate heater, Tmax. = 1300 °C
Pumping equipment : ion pump, Ti sublimation pump, cryopump and magnetic bearing turbo molecular pump
Sources : 8 effusion cells (models SFC, HTC. DFC, LTC-V) 2 nitrogen sources
Analysis equipment RHEED system (50 kV) pyrometer (1 heatable window HW-63/40-W) ellipsometer (2 heatable windows HW-35/20-W) mass spectrometer beam flux monitor (model BAF) quartz oscillator sensor
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