We
design and manufacture a large variety of UHV and MBE substrate manipulators
according to your specifications. The manipulators can be built for all
types of sample holders and various substrate sizes.
Temperatures up to 1300 °C are standard. Special manipulators reaching higher temperatures (up to 1700 °C) are available, as well as cooling stages for liquid nitrogen and liquid helium.
Different linear and rotational degrees of freedom allow a precise adjustment
of sample in the MBE system. Continuous sample rotation is standard. Manual
or motorized linear and rotational drives are available. The manipulator
fits the wafer transfer system of he customers facility. An optional shutter
is used to protect the substrate before and after epitaxial growth.