	Scientific

MOCVD Systems for Research and Development from ANNEALSYS

Features:

Low Cost 2-inch and 4-inch MOCVD Reactors
Applications: Semiconductor, High k Dielectric, Superconductors, Ferroelectric, Colossal Magneto Resistance, Thermal Coatings, Oxides
Direct Liquid Injection Vaporizer Reactor Bypass,
'Cold-Wall'-Design, Rotating and Heating Substrate up to 850 °C
Fully Automated and Manual Operation,
Up to 8 process gas lines with digital MFC, Purge gas line with needle valve
Vertical Furnace for Process up to 1000 °C
Up to 4 precursors or Precursor Mixtures
Thermocouple Control with PID Temperature Controllers; Vacuum and Pressure Control

Applications:

- Semiconductor: SiO₂, HfO₂, Ta₂O₅, Cu, TiN, TaN, …
- High k Dielectric: SrTiO₃, BaTiO3, Ba_(1-x)Sr_xTiO₃ (BST)
- Ferroelectric: SBT, SBTN, PLZT, PZT
- Superconductor: YBCO, Bi-2223, Bi-2212, Tl-- 1223, …
- Piezoelectric: (Pb, Sr)(Zr,Ti)O₃, Modified Lead - Titanate
- Colossal Magneto Resistance
- Thermal coatings, Buffer layers, Mechanical coatings, Optics
- Etc…

Substrate Types:

• Mono crystalline wafers for Epitaxial Deposition
• Silicon wafers
• Compound semiconductor wafers
• Poly silicon wafers for solar cells
• Glass substrates
• Etc…


Schematic Drawing for MOCVD System	Liquid Panel for CVD Reactor

MC25 1-inch MOCVD System Design Specifications:

• Compatible with a wide range of liquid vaporizers
• Up to 4 precursor liquid lines
• Optimized organometallic chemical liquid line panel
• Manual or automatic procedure for chemical cleaning of liquid lines
• Reacting compounds connections on chamber (H₂O, O₃…)
• Easy shower-head dismantling for cleaning
• Gas panel for CVD applications

MC100 4-inch MOCVD System Design Specifications:

Compatible with a wide range of liquid vaporizers
Up to 4 precursor liquid lines
Optimized organometallic chemical liquid line panel
Automatic procedure for chemical cleaning of liquid lines
2 chemical reacting compounds connections on chamber (H₂O, O_3...)
Easy shower-head dismantling for cleaning
Heated by-pass valve up to 300 °C
Vertical linear motion mechanism up to 100mm
Gas panel for CVD applications
Optional pressure monitoring before shower-head injection connections


MOCVD 1-inch System Specifications	MOCVD 4-inch System Specifications