Scientific

HR-XRD & XRR    

 

   High Resolution X-ray Diffraction and X-ray Reflectivity Systems

Bede Scientific is the global leader in non-destructive X-ray metrology systems. Bede Systems deliver dramatic yield enhancement through the absolute measurement of Semiconductors, OLEDs, LEDs, Thin-Films, Laser Coatings, Photovoltaics and pure single crystals.  These measurements include not only thickness, but also structure, roughness and composition as listed below.


Features
  • Automated source/detector configuration change – precise, motorized optics – no manual intervention – productivity +
  • Recipe-driven REMOTE operation from work or home – a Fab proven tool – 7/24/365 
  • Overnight automated runs by recipes, scripts and libraries – frees engineer – enables true multi-tasking
  • Channel Cut Crystals (CCC) designs that optimize X-ray intensities, Ge(004) and Si (022) 
  • Vertical diffraction geometry maximizes precision and angular resolution – eliminates noise 
  • Patented Genetic Fitting Algorithm – robust and highly accurate – true money saver
  • Microsource – the brightest source
  • ScribeView the smallest beam 

High-Resolution X-ray Diffraction (HR-XRD)

X-ray Reflectivity (XRR)

X-ray Fluorescence (XRF)

X-ray Diffraction Imaging (XRDI)

X-ray Diffraction (XRD)

 

HR-XRD & XRR are used to Measure:

% Crystallinity (% amorphous) % Relaxation of strain in Epilayer
Area uniformity 
Average grain/crystallite size
Bulk phase identification 
Buried edge damage 
Composition of Epilayer
Curvature (Bow)
Density of layer
Depth Profile
Dislocation 
Distinguish strain from tilt
Distinguish roughness from grading 
Film quality In-Plane vs Out-of-Plane  
Interface roughness 
Lattice tilt
Lattice map
Miscut
Mismatch
Onset of crystallization
Onset of relaxation
Overlayer thickness  
Periodicity of superlattice
Phase identification  
Pole figure
Pore size  
Porosity
Preferred orientation of crystal
Residual stress  
Strain in Epilayer
Strain
Structural defects
Structural dislocations  
Structural misfits in epitaxy
Structural orientation
Texture analysis
Thermal slips
Thickness of layer 
Thickness of Epilayer 
Thin film phase identification
Tilt/Twist mosaicity

Bede D1?

Bede D1  University & Industrial Research & Development

BedeMetrix™-L   Advanced Semiconductor R&D Metrology

BedeMetrix™-F    In-Line, High Volume Semiconductor Metrology

Bede7000    In-Line, High Throughput Semiconductor Metrology

BedeScan™    Surface and Buried Defect Detection
 


C4 Scientific Systems
754 Leona Ln
Mountain View, California 94040
Phone:  (650) 961-6620
FAX:  (650) 961-8591
support@c4scientific.com