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New
VDS
Vosskuehler: High Performance Digital X-ray Detector |
- EXTREME HIGH RESOLUTION X-RAY DETECTOR
- Ultra High Resolution with 11 MegaPixels
- 4024 (H) x 2680 (V) pixels at 3 fps
- Energy Range: 20-150 keV
- Applications: X-Ray Microscopy,
Micro-Tomography, Printed Circuit Inspection, X-Ray Diffractometry
- Peltier cooled option
- Used as Components and Systems for Industrial
and Medical Image Processing
- Infrared cameras for NIR (0.9 - 1.7 µm) and
LWIR (8 - 14 µm)
- Pixel size: 9mm
x 9 mm
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New
Mini
Maria - Face Down Organic Vaporizer from CreaTec |
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- Universal OLED
Evaporator for Face-Down Evaporation
- Face-Down Crucible
Temperature Controlled and Individually Powered by Thermocouple and
PID Controller
- Special Orifice
Design for High Uniformity
- Crucible Refill
without Breaking Vacuum
- Water Cooling,
Efficient Heat Shielding
-
- Manual or Motorized
or Pneumatic Shutter
- Mounting on 2.75"
CF Flange, UHV Compatible
- Crucible Materials:
W, Mo, Ta, Al2O3, PBN, PGR, BeO, Quartz
- Crucible Capacity:
1 ccm Inner Crucible
- Customized
Insertion Length
- Max. Heating Power
Each Heating Zone: 300W, I=10A, U=30V
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New
Laser-XPS by XPS International |
- Applications:
Foto-Voltage, Foto-Chemistry, Laser Irradiation, UHV Surface
Cleaning, Regulated Charge Compensation, Direct Analysis of
Phosphorescent States, Surface Damage Studies
- Direct Measure of Excited Core States
- Dynamic and
Reversible Changes of Core and Valence- Band Electron Interactions
for Electronic Imaging
- 2P-Exitation with
Two Tunable High Power CW-Lasers
- In-Situ Detection
with Correlated Ultra-Fast DelayLine Detector
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Infrared
Spectroscopy with XPS, UPS and ISS; LEELS (5 meV), STM-Adaptation,
Sample Preparation, Surface Conductivity, Fast-Entry Load-Lock with
Glove Box, Adaptor
for HP-JET UHV Bio-Reactor
-
Large
UHV-Distribution Chamber for up to 8cUHV-Chambers with Horizontal
Sample Transportation (NanoParticles, NanoDust)
-
Extension
with 2nd or More UHV-Distribution Chambers
-
InSitu
Process Control, Fully Automated Operation, User Friendly, Low Maintance,
User-Servicable, Multi-Technique NanoBio Reactor System
-
UHV-Conditions
During Vacuum Transfer (p<1x10-9 mbar)
-
Fast
transfer < 45 sec, Transfer of Large (up to 8” diameter)
and Heavy Sample (> 1 kg), Laser Diode Substrate Heating
-
No
Cross-Contamination Between Different Chambers
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- The imaging
Energy Analyzer iEA allows to eliminate secondary and inelastically
scattered electrons
- iAES SPEPEEM
- PEEM III with Imaging Energy Analyzer iEA
- Auger Electron Imaging
(AEEM) enables chemical imaging
- Direct Imaging of the
Energy Dispersive Plane by new Projector Lens for highest AES Energy
Resolution
- High Resolution HR-SEEM
with Narrow Energy Window
- Applications: Spectromicroscopy,
Microspectorscopy and Photo Electron Diffraction, Photo Electron Spectroscopy
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- for Biology, MALDI-TOF-MS,
BioOrganic Semiconductors, NanoTechnology, BioOrganic Surface Chemistry
- High-Intensity Beams
for Beam-Surface Reaction and Time-Resolved Reaction Experiments
- Macro-Molecular Beam
Injector for Collimated, Scanable, High Flux Molecular Beam (Organic
Molecules, DNA)
- Electro-Spray Inlet
System with High Intensity Beam Ion Source
- UHV System with Multi-Stage
Differential Pumping System for UVH Compatible Beam Conditions
- Adaptor
for HP-JET UHV Bio-Reactor
- BioJet
is Powered by USF Bulls
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- The Role of Lifelong
Education in Nanoscience and Engineering is held at the 2008 MRS Spring
Meeting in San Francisco, CA
- The goal of this symposium
is to encourage forums that exchange and analyze information, explore
best practices, and elaborate recommendations for life-long education
in nanoscience and engineering.
- Applications: Electronics
on Unconventional Substrates
- Lifelong
Education is powered by Georgia Tech, ACC
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- Conversion
of a conventional high energy ion gun into a low energy ion gun.
- The conversion procedure
maintains the ion current capability of the high energy gun along
with its good spatial and ion energy distribution characteristics.
- Several low energy
ion guns have been described previously in the literature, but all
require the construction of new ion optics, whereas this approach
utilizes existing ion optics and electronic control capabilities of
a commercial ion gun.
- This ion gun may be
employed for studies where it is desired to use ions as reactive species
without significant sputter damage of the target.
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- SpinField 2D Magnetic
Field Platform for Two-Dimensional Magnetic Field Generation of Arbitrary
Direction and Strength
- Finite-Element Design
for Highest Field Uniformity
- Maximum field: +/-
300 Oe, Adjustable, Max Current: 2A
- SpinField Gaussmeter:
Magnetic Hall Sensors for XY Mapping
- SpinEtcher-1000 Plasma
Processing System for Photoresist Ashing using Oxygen Plasma, Microincineration
of Organic Materials
- Applications: BioMagnetism,
Bio-Imaging, Organic Sample Preparation, BioSpintronics
- DirectVacuum
is powered by Micro Magnetics
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- Manipulation of Kondo
Effect in 2-D Molecular Assembly
- A molecular Hexagon
is created by sculpturing a TBrPP-Co molecular ribbon on Cu(111) surface
at 4.6 K using STM-tip. This Hexagon is then used to investigate the
influence of near neighbor molecules on the Kondo resonance.
- Applications: BioComputing,
BioSpintronics
- HP-JET
UHV Bio-Reactor Compatible
- Shaping the future
by controlling the atomic world...
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- The MFC was nominated the NASA Government Invention of the year.
The winner was selected by NASA's General Counsel and was approved
by the NASA Administrators
- Congratulations to everyone who has made the Macro Fiber Composite
the success story it is today!
- LaRC
MFC is powered by Smart Material
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New
Maria -
Mini Multi Pocket Organic Vaporizer |
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- Universal OLED
Evaporator for Face-Down Evaporation
- Face-Down Crucible
Temperature Controlled and Individually Powered by Thermocouple and
PID Controller
- Special Orifice
Design for High Uniformity
- Crucible Refill
without Breaking Vacuum
- Water Cooling,
Efficient Heat Shielding
-
- Manual or Motorized
or Pneumatic Shutter
- Mounting on 2.75"
CF Flange, UHV Compatible
- Crucible Materials:
W, Mo, Ta, Al2O3, PBN, PGR, BeO, Quartz
- Crucible Capacity:
1 ccm Inner Crucible
- Customized
Insertion Length
- Max. Heating Power
Each Heating Zone: 300W, I=10A, U=30V
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New
High
Resolution X-Ray Diffraction and X-Ray Reflectivity |
-
Automated source/detector configuration change –
precise, motorized optics – no manual
intervention – productivity +
- Recipe-driven REMOTE
operation from work or home – a Fab proven tool
– 7/24/365
- Overnight automated
runs by recipes, scripts and libraries – frees
engineer – enables true multi-tasking
- Channel Cut Crystals (CCC)
designs that optimize X-ray intensities,
Ge(004) and Si (022) - Single and Dual channel
cuts
- Vertical diffraction
geometry maximizes precision and angular
resolution – eliminates noise
- Patented Genetic
Fitting Algorithm – robust and highly accurate –
true money saver
- Microsource™
– the brightest source.
ScribeView™
–
the smallest beam
- In Fab, 300mm, wafer
systems with 1 or 2 FOUPs, all SEMI specs
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- Breakthrough technology - superior performance
- 11 MegaPixels
- Highest quality optical, mechanical and
lighting performance
- 7,000X with recording to DVD, CD or movies.
Still captures.
- 3D rotary head adapter performs a smooth 360
degree rotation allowing a complete view of any sample without moving
the sample itself.
- Hirox provides interchangeable 3D inspection,
in-line, off-axis view lenses
- Advanced software produces 3D relief
constructions
- Precision, high resolution and quality ready
for all your failure analysis, QC and QA needs.
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New
WildWobbleWindow from Transfer Engineering
and Manufacturing |
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- Western
Territories:
C4 Scientific
Systems
- Eastern
Territories: NanoTechScientific
- USA:
SPECS Scientific, Florida, USA
- Canada:
OCI Vacuum MicroEngineering
- Brasil:
M & M Vácuo & Ciência; São Paulo
- Germany:
OmniVac, Kaiserslautern, Berlin
- Poland:
PREVAC
- Sveden:
VG-Scienta
- Most Standard
Spare Parts in Stock, 24h Service
- UHV:
Design, Manfacturing, Sales, Service, Support
- Scientific
Consulting, Machine Engineering, Training Courses, Quality
Control Certificates
-
SURFWARE - Communication and Support Software
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-
- Imaging of Latent Eccrine
Fingermarks Deposited on Polished and Roughened Metallic Surfaces
- SKP Visualises Fingermarks
Obscured Beneath Optically Opaque Soot Films and Retrieves Ridge Detail
Where Fingermarks have been Physically Removed from a Metal Surface
- Completely
Non-Contact Technique, No Need for Use of Developers, Fingerprints
can be Retrieved While Still Leaving Intact DNA Evidence
- Application: Latent
Fingerprints on Spent Cartridges: Organic Fingerprint Material is
readily destroyed by heat (Gun Firing, Bomb Explosion etc). SKP Images
the Non-Volatile, Inorganic Component of Eccrine Secretion, Which
Remains Intact Even When Exposed to Temperatures as High as 600°
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- Author: Winfried Schuelke,
University of Dortmund
- New Developments of
Synchrotron Radiation X-Ray Sources (X-Ray Free Electron Laser - XFEL)
- Comprehensive Review
of Experimental Methods, Theory, and Successful Applications of Inelastic
X-Ray Scattering and Synchrotron Radiation
- X-Ray Raman Scattering
(XRS), Compton Scattering
- Resonant Inelastic
X-Ray Scattering (RIXS) Enables the Study of Electron Dynamics via
Electronic Excitations in Very Selective Manner (e.g. Selectively
Spin, Crystal Momentum, or Symmetry)
- Investigation
of Electron Dynamics in Condensed Matter (Correlated Motion and Excitation)
- Applications:
X-Ray Monochromator
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- Recipient: Albert
Fert, France; Peter Grünberg, Germany
- Citation: "For
the Discovery of Giant Magnetoresistance"
- Giant MagnetoResistance
(GMR) is a Quantum Mechanical Effect, a Type of MagnetoResistance
Effect, Observed in Thin Film Structures Composed of Alternating Ferromagnetic
and Nonmagnetic Metal Layers.
- Applications:
Spintronics,
Scanning Magnetic Microscopes, Magnetic Sensors
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-
Recipient:
Bjorn Wannberg, Gammadata Scienta AB, Uppsala
-
Citation:
"For advances in the development of angle-resolved electron
analyzers for photoelectron spectroscopy."
-
Wannberg invented a novel way to operate a hemispherical
electron energy analyzer in order to collect the energy distributions
for a large number of emission directions in parallel. The successive
improvement of this so called “angular mode” has been
one of his main tasks ever since.
-
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-
Digital
4-Channel LockIn Amplifier between 3 mHz and 1 MHz with Reference
Output and Reference Input (1st to 15th Harmonic)
with Approximately 40 kHz Update Rate
-
Spectrum
Analyzer, 4 Channel Oscilloscope, Sinus Generator
-
Analogue
Output of 4 Channels with 156 kHz Sampling Rate
- On-Screen 4-Channel
Spectra Acquisition
-
Measurement
System with 8 AUX-In and 8 AUX-Out
with 24 bit Resolution and 160 kHz Update Rate
- Dynamic Reserve >
135 dB, Phase Resolution 0.001 deg
-
USB Data Storage and Network Connection
-
32
MB Data Space, Webserver for all Data
-
PLL Reference Input with Less Than10 Degree Phase
Deviation (Over the Full Frequency Range)
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- Ultra-High Femto
Resolution due to Femto-Amplification
- Zero Adjustment,
Automatic Polarity Indication of Input Current, Current Monitor
Output, Overvoltage Protected Input, Remote Control Interface
- Applications: Scanning
Electron Microscopy, Scanning Auger Microscopy, Scanning Ion Microscopy,
Ångstrom Current Detection Microscopy
- Battery Pack to Bias
the Current Source to +/-90V
- 100 fA Resolution,
Measures Current from 100 fA to 2 mA with Overranging on All Ranges,
4 1/2 Digit Resolution
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-
Applications:
TPD (Temperature Programmed Desorption) also known as TDS (Thermal
Desorption Spectroscopy)
-
Thermal
Desorption Spectrometer TDS 40A1 with Thermal Power Unit and Controller
Eurotherm2408 and SRS's Mass Spectrometer Type: RGA100, 200, 300
or QMS100, QMS200 and QMS300
-
New
"Boca"-Mass Absorber for Highest Senistivity
-
Mounting
on DN 40CF Flange, Differential Pumping System
-
RGA
produced by Stanford Research Systems Inc.
-
Special
Software for Thermal Desorption Spectroscopy
-
Software
Graphics User Interface for: Pressure vs. Temperature Chart, Pressure
vs. Mass Chart, Thermal Process View Chart
-
Control
Application, Sample Heating Power Supply HEAT-PS2
-
Sample
Holder PTS 1200 H/C, UHV Sample Manipulator
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- High-Precision 6-Axis
Manipulator with Full Motorization, Regulated Power Supplies
- Fully UHV Compatible,
Bakeable
- Heating and He N2
Cooling Options
- Z-Stroke 600 mm,
X, Y Sroke +/-12,5 mm
- Angular Resolution
0,1° motorized
- Contineous Rotation
Around Sample Normal, Motorized, Regulated Power Supply
- Applications: Angular
Resolved Spectroscopy
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- High Pressure Cell: Static or Flow Through High Pressure Reactor
- IR Fibre Substrate
Radiation Heater System with High Power IR Diode Cooled CW-Pulsed
Laser from Surface
- Gas Inlet and Purification
System for Ultra-Clean Gases
- Reaction Gas Analysis
System, InSitu Process Control
- Reactors with LN2 Cooling
Systems and Heating up to 650C.
- Optionally, the System
can be Upgraded with Different Detector Types (such as VG Scienta
Analysers, EA 120 MCD etc), Beamline, Monochormator, a UHV Preparation
Chamber, a High Pressure Cell, and a Windowless X-Ray Entrance (3-Stage
Differentially Pumped)
- Adaptor
for HP-JET UHV Bio-Reactor
- Applications: High
Pressure X-Ray Photoelectron Spectroscopy
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-
PE-CVD
Reactor, MFC-Regulation, Computer Controlled Operation, CNT-Optimized
Production, High-Throughput
- Applications: Solar Cells, NanoMagnets, NANO-MEMS, NANO-CHIPS,
Drug Delivery, NanoLight, BioNano Catalytic Converters, NanoFashion,
Energy Transport and Transformation, NanoSuper Structures, NanoAnalysis
- UHV-Construction, Turbo-Pumped,
Load Lock
- Adaptor
for HP-JET UHV Bio-Reactor
- C2H2, NH3 Configuration
Standard, Others Optional
- In Situ Growth Monitoring,
Analytical Equipment Optional
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- Special Preparation
for Stable and Precise Flux Control
of High Pressure Organic Compounds and other
High Vapor Pressure Materials
- CreaTec Near-Ambient
Temperature Effusion Cell OrganoJet is a Unique Instrument to Evaporate
Organic Materials in the Temperature Range between -50 °C and
300 °C
- for OLED, Aero Space
Applications, Solar Cells, Organic Semiconductors, NanoLight, BioOrganic
Catalyzers
- Horizontal or Vertical
Evaporation, Controlled Beam Conditions due to Proprietary Beam Nozzle
Design with Heat Exchanger Fluid System
- Integrated Mechanical,
Pneumatical or Elecetrical Shutter System
- Fully UHV-Compatible,
CF Mounting, Customized Geometry
- Thermocouple, PID Controller,
Power Control Unit
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- Superconducting Quantum
Interference Devices and their Applications (RF-DC-Amplifiers+Electronics
)
- Low-Noise Radio Frequency
Amplifiers Based on SQUIDs
- Near-field Scanning Microwave
Microscopes
- Nondestructive Evaluation
Using SQUIDs
- Approved Technology form ez-SQUID Systems
- Educational Products and Demonstrators
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- DNAPrint® Genomics,
Inc. is an Applied Science Company Focused on the Development and Marketing
of Innovative Genetic Testing Products and Services. Our Scientists
Aim their Research Towards Discovery of DNA Analysis Solutions to Serve
Clients in Forensic Science, Genealogical Research, and Pharmaceutical
Development.
- DNAWitness™2.5 for
the Forensics Market: “Molecular” Eye-Witness, Quantitative
DNA Analysis , Genetic Profiling, DNA Barcodes
- Pharmacogenomics, DNA-Tailored
Drug Administration, Cancer Research and Treatment, Single Nucleotide
Polymorphism ('SNP') Markers, Genetical Paternity Fingerprints, GENOTYPING
- ANCESTRYbyDNA™:
Pan-Chromosomal Assay for Genetic Ancestry, Ancestry Informative Markers
Mapping, Genetic Ancestry and Heritage Science and Reserach,
BioGeographical Ancestry (BGA)
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- ML-RHEED - Magnetic Lens Reflection High Energy Electron Diffraction
Gun, Differential Pumping
- for Diffraction Studies and Growth Monitoring in MBE/PLD/CVD/OLED
- HP - Applications
- 30kV RHEED Energy, Magnetic Lenses
- Independent Grid Control, X, Y Deflection
- Air-Side Magnetic Lens and Deflection System
- Factory Aligned, Beam Blanking/Rocking Option
- UHV-Approved, Easy Filament Replacement and Alignement, Flight
Tube for Filament Protection
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- Non-Destructive, Fast
Determination of Spatial Density and Density Depth Profiles of the Dopants
with Ultra-High Resolution
- Dopant Detection by
Electron Induced X-Ray Emission Using Parallax's Patented LEXS X-Ray
Spectrometer Technology
- Determination of Ultra-Low
Dopant Concentrations in Angstrom-Thin Layered Structures and Diffusion
Barrier Layers
- Highest Boron Detection
Sensitivity of any X-Ray Spectrometer with New Collimation Optics, Optimized
for Boron
- In-Situ Dopant Analysis
with Existing Cluster Tool
- Advanced Charge Neutralisation
Plasma System
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- WDS in True UHV Design
with All Metal Seals
- Based on the Proven HEXS
Spectrometer Concept
- Applications: Wavelength
Dispersive Spectroscopy, Energy Dispersive Spectroscopy, X-ray Fluorescence
(XRF) Spectroscopy, X-ray, EUV or XUV Lithography, Plasma Diagnostics,
X-Ray Microscopy, Synchrotron X-Ray Optics, Micro-XPS or ESCA, Diffractometry
- Retractable X-Ray Collimating
Optic, Hexagonal Diffractor Turret, Sealed Proportional Counter, X-Ray
Concentrating Optics with Small Detector Window
- UHV Gate Valve and Pumping
System for Achieving UHV Levels. This system IS NOT DIFFERENTIALLY PUMPED
- HEXS Data Acquisition
and Processing Software
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- UltraHigh Resolution
Process Control for Advanced Process Applications, New
Compound Semiconductor Materials, New
Materials Engineering, Protein Crystallography
- Applications: III-V Growth
(GaAs, AlGaAs ), Advanced Metals Deposition, Rare Earth Oxides, HTC
Giant SuperConductors, Bio Materials
- PHARAO Machine of the
Paul-Drude Institute (PDI) at BESSY III, Adlershof, Berlin, FRG with
UltraHigh Resolution
Synchrotron Radiation
- High-Precision RHEED
Source HP-4 with Energy Filter TOPAZ and SAFIRE VIDEO-RHEED for In-Situ
Monitoring
- UHV-Design with High-Resolution
Substrate Rotation
- Fully Automated Instrument
Control with EMERALT
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- SNOM for Nanoscale Chemical
Imaging and Spectroscopy with NanoScale Resolution for
Biological Applications
- Combined Infrared NanoSpectroscopy
-Scanning Near Field Optical Microscopy- Atomic Force Microscopy - Scanning
Near Field Infrared Microscopy - Topography - Superimposed IR-AFM Spectroscopy
- Knoll-Keilmann Aperture-Less
Design
- Applications: Genetic
Engineering, NanoSurgeries, BioSpectroscopy, High Resolution Chemical
Spectroscopy
- New High Transmission
Capillary for Low Sensitivity Signal Recovery and High
Sensitivity IR-Detector with Selective Phase Resolution
- Fully Digital Electronics
with NanoResolution Feedback Control
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-
NanoSphere
Bench-Top High Vacuum Platform for Research and Development and
Industrial Vacuum Coating Applications
-
VapourPhase
Ω Advanced Thermal Evaporation Source Mounting System for Single
and Multilayer Vacuum Deposition Processes
- Low Cost Alternative
to Electron Beam Technology.
- Sequential Evaporation
of up to 4 Materials with High Current, In-Vacuo Switch and High Current/High
Voltage Power Supply
- Unique Power Rail Source
Mounting, Individual Source Baffling
- Rapid Release Source
Clamping System
- Fully Automated Operation
with PC-Based Control System
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- NanoDeposition UHV Research
Systems, for Thermal, Sputter and NanoCluster Deposition Processes with
In-Situ Growth Monitoring, RHEED, Surface Analysis, Ellipsometry
- Fully Automated System
Operation and Process Control
- RF Plasma Atom- and Ion-Sources
with Auto-Tuning, up to 1000 Watt Power for 10"CF Atom Production
Sources
- NanoCluster Generator
with High-Resolution Mass Filter
- E-Beam UHV-Evaporators
with Single or Multi-Pocket Capabilities for Sequential and Synchronous
Operation
- Thermal Gas Crackers
for Generation of Atomic Fluxes of Reactive Species: Atomic Oxygen ,
Atomic Chlorine etc.
- UHV Magnetron Sputter
Sources up to 8" CF Mounting
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- Energy Filter, Model
'Beatrix', for Energy Filtered High
Resolution-Photo
Electron Emission Microscopy
- High Transmission for
High Electron Energies
- 0.1 eV Energy Resolution
in Spectroscopy Mode
- 0.5 and 1eV Energy
Pass Bands in Imaging Modes
- Selectable Apertures
by PC-Controlled Moveable Slits with High-Precision UHV Linear Feedthroughs
- Three Energy Modes:
Energy Filtered Image; Energy Filtered Photoelectron Angular Distribution;
Photoelectron Energy Spectroscopy
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- Monochromator with
24" Rowland Circle
- High-Power X-Ray Source
with XY Manipulator
- Monochromatized Al
K Light, FWHM < 0.3 eV
- New
Monochromatic Aberration Correction
- New
Dual-Focussing Lens Optics
- 6" x 6" Toroidal
Crystal Geometry for Bragg Reflection
- High Stability Crystal
Holder, Easy Crystal Alignment
- 8" CF Mounting
Flange, Small Compact Design
- Differential Pumping
with 50 liter/sec Ion Pump
- Internal Shutter for
Crystal Protection
- X-Ray Source Power
Supply with 1000 Watt Power
- MXPS with
Energy
Analyzer EA 120 MCD
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- Biological Data Processing
Tool with CMOS Interface
- Bio-SPECS DNA Manipulation
Software System for Precise DNA Engineering and Process Monitoring
- Applications: Genetic
Engineering, New Biological Materials, Biological Machines, Energy
Generation, Biological Propulsion, Femto-Science, Waste and Disease
Eradication, Artifical Intelligence, Neuronal Networks, Animal/Plant
Research
- In-Situ Video-Camera
for Quality Control
- Biological Analyzer
with Atomic Resolution
- Biological Specimen
I/O System
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- IPES probes Between
the Vacuum and the Fermi Level, which is not accessible for PES experiments
- Bandpass Filter with
UV Photon Detector
- Single Channeltron,
mounted on 2.75" CF, LiF, CaF2, NaCl-Window, Preamplifier and
Pulse Counter with USB Interface
- Power Supplies, Data
Acquistion Software for Signal Counting and Control of Electron Source
Energy
- Indirectly Heated Filament
Electron Source, Beam Characteristics with High Current in Low Energy
Range and Small Energy Distribution
- 10" UHV Cluster
Flange mounting with Integrated Viewport
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- True 180° Hemispherical
Energy Analyzer EA 120 MCD, with 120 mm analyzer mean radius
- Fringe Field Correction
for Ultimate Energy Resolution
- Mu-Metal-Liner for analyzer
lens and hemisphere
- 6 different entrance
slits (selectable, indexed) for various spot sizes and solid angles
of acceptance
- 5-Channeltron Detector
Array MCD 120
- UltraHigh Stability Power
Supplies and Control Electronics for Full Analyzer Remote Control
- SPECTRA Software Package
for Data Acquisition and Data Processing (XPS, UPS, AES, ISS)
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- The Network Competence
is a cooperation of manufacturers producing systems and components
for surface science
- Working together as
the Network Competence we produce customised special systems for complex
surface analysis applications, which offer unparalleled flexibility
and adaptability.
- Each of the Network
partners is producing top specification instruments within their own
field. By pooling and combining their expertise, the network is able
to offer systems of a complexity and level of integration across disciplines
which was previously unavailable in the surface science market.
- By making use of the
individual specialisms operating within the close communication framework
of the Network, new systems can be developed more rapidly leaving
more time for the most important part . . . our customers research!
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- Nascatec-Levers, made
out of Single Crystal Silicon for Highest Chemical Stability and a
High Q-Factor
- Cantilevers for all
AFMs! Piezoresistive-, Electrostatic-, Magnetic Force Cantilevers,
Cantilevers with CNT etc
- Extra Sharp Tips with
Radius of well below 10 nm
- Electrostatically Driven
NanoGripper for NanoManipulation with Force Feedback Loop
- SNOM-Cantilevers with
a Hollow Pyramid (Aperture Size of 50, 100 nm, or customized Size)
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- OCI: World Wide Market
Leader of LEED-AES Spectrometers
- NANO-SCALE MEASUREMENTS
OF SURFACE PERIODIC STRUCTURES WITH FEMPTO-AMPERE ELECTRON PROBE
- Fully-Digital Fempto-LEED
for Electron Diffraction on Insulating Single Crystals with Delay
Line Detector Large Coherence Width
- Auger Data Acquisition
Software with Real Time Signal v.s Energy Analysis, Auger Depth Profiling
- LEED Image Analysis
System with highest Resolution Low Light CCD Camera, Frame Grabber,
and Ambient Light Cover
- Digital LEED-AES Controllers,
Digital Raster Scan
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- The AFM Module implements
the Q-Plus Design from the University of Augsburg into the LT STM
- AFM Sensors with optimized
physical properties at Low Temperatures
- AFM Tips with defined
Chemical Composition and Structure
- Atomic Manipulation
on Insulating Substrates
- Atomic Force Signals
(Frequency Shift, Phase, Amplitude, Damping) Simultaneously with Tunneling
Current during Scanning and Atomic/Molecular Manipulation
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- New Design for Maximum
Transmission and Fast Band Mapping
- Optimized for Low Kinetic
Energies (0.2 - 20 eV)
- Excellent Energy and
Angular Resolution
- Transmission/Imaging
Mode for Optimization
- Delay-line detector with
MCP (Ø 40 mm)
- Theoretical Energy Resolution
Better than 150 ueV (at 2 eV Ekin)
- Ultimate Resolving Power
(Ekin/Delta E) > 10,000
- Maximum Angular Acceptance
±18°
- Angular Resolution of
0.08°
- Angular Resolved Modes:
±7°, ±15°
- High Voltage Electronics
with Extreme Stability
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- LEEM IV, Low Electron
Emission Microscope
- Low Cost, Ease of Use
- Full Magnitec Shielding
- LEEM/LEED and PEEM modes
computer controlled
- High Resolution <
20 nm
- Field of view in LEEM
mode 3-75 µm
- Field of view in PEEM
mode 3-85 µm
- LEEM IV Options: Sample
Manipulator, LN Sample Cooling, Preparation Chamber, Vacuum System
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- Composition Measurements
using Multi-Wavelength
Laser Interferometry for In Situ Monitoring in MBE, CVD, PVD, ALD, PLD,
MOCVD, MEMS, OLED, Solar, Nanotechnology
- Applications: Film Uniformity,
Lattice Strain, Wafer Bow Monitoring (Patent Pending), Surface Particulates,
Process Residues
- Advanced Optical In
situ Monitoring for VCSEL, Failure Analysis, Fault Isolation, Quality
Control, Real Time Analysis, GaN Growth
- Software Provides Fully
Automated, Quantitative Analysis In Real Time, Synchronized With Substrate
Rotation
- Optical Reference Systems:
for In –Situ Process Information
- Emissivity Corrected
Pyrometer (ECP) Combined With Single- Dual-, Tripple Wavelength Reflectometers
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- Highest Precision Organic
and Metal Evaporators for Opto-Electronic Devices and Organic Solar
Cells
- Variable Temperature
Range: 50°C - 600°C
- Single-, Dual-, Triple-
or Multiple Evaporator Assembly
- Alumina, AlN, Graphite,
BN Crucibles with Quartz Liner for Very High Stability at Low Evaporation
Rates
- 0.5 ccm, 2 ccm, 4ccm
or 8ccm Crucible Capacity
- Evaporation Control
Units with DC Power Supply, Integrated PID-Controller and Combined
Temperature and Growth Rate Controller, Computer I/O Interface Optional
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- High-Resolution Scanning
Magnetic Microscope for Current Density Images of Operating Integrated
Circuits
- Applications: Failure
Analysis, Fault Isolation, Yield Enhancement of ICs, Magnetic Imaging,
Quality Control
- Advanced Giant MagnetoResistance
(GMR) and Magnetic Tunnel Junction (MTJ) Sensor Technologies
- Magnetic Fields Detection
for Nanoteslas
- Full Optical and/or NIR
Navigation and ROI Selection
- Automatic Sample Tilt
and Contour Correction
- Five Distinct Contact
and Non-Contact Scanning Modes
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-
Electron
Evaporator mounted on 2.75" CF flange, fully UHV-compatible
-
Evaporation
of Rod Material or From Small Conductable Crucibles
-
Evaporation
of W, Ta, Mo, C, Pt, Cr, Ti, Fe, etc. from wire and Ag, Au, Al, Ni,
etc. from crucibles or wetted wire cages
-
Deposition
rate ca. 2 nm/min. for High Temperature Materials and 15-20 nm/min
for High Vapor Pressure Materials
-
Flux
Regulation Via Ion Current Electrode and PID-regulator
-
Integrated
Manual or Electro-Pneumatic Shutter
-
Rear-Loading
Evaporant
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- For Work Function Measurements,
Surface Photovoltage and Potential Measurements, Contact Potential
Difference
- Ultimate Work Function
Resolution: 1-3 meV
- Upgrade to Absolute
Kelvin Probe (PhotoEmission Package).
- UHV Probe on 2.75"
CF Mounting Flange
- Ambient Scanning
Kelvin Probe System
- Digital Control of
all Probe Parameters
- Software Selectable
Tip or Sample Biasing
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-
Continuous
Wave or Pulsed Laser, with Laser Cooling
-
Focussing
Optic with Light Fiber, UHV Shutterd Viewport
-
High
Power Diode Laser Module with Power Supply
-
Control
Unit for Advanced Laser Processing with High Speed Linux PC, with
Real Time Kernel
- Better Vacuum at High
Substrate Temperature: 1200 °C at 10-8 mbar, Higher
Temperatures - Independent of the Process Pressure: 1300°C, 1400°C...
- Any Temperature Ramp
Possible - only limited by the Material Properties
- Flash Heating of Thin
Films
- Flash Cristallization
of Amorphous Thin Films
- Advanced Processing:
Cleaning, Heating, Annealing
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- Quality Construction,
Strong Coupling with RF/DC power
- Wide Range of Sputtering
Targets: Metallic - Insulating, Magnetic - Non-Magnetic
- Excellent Film Uniformity
and Target Utilization
- Enhancement from Magnetic
Assembly due to Electromagnetic Finite Element Calculations, NdFeB Rare
Earth Magnet
- Easy target change, Versatile
sizes, Easy Maintenance
- Combinatorial Thin Film
Deposition, Superconducting Films, Spintronic Devices, MEMS, Biosensors,
Nanotechnology
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- Low Cost 2-inch and 4-inch
MOCVD Reactors
- Applications: Semiconductor,
High k Dielectric, Superconductors, Ferroelectric, Colossal Magneto
Resistance, Thermal Coatings, Oxides
- Direct Liquid Injection
Vaporizer, 'Cold-Wall'-Design, Rotating and Heating Substrate,
- Fully Automated and Manual
Operation,
- Up to 8 process gas lines
with digital MFC
- Vertical furnace for
process up to 1000 °C
- Up to 4 precursors or
precursor mixtures
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-
Golden
(Chemically Resistive) Vibration Isolated STM Body With Implemented
Preamplifier
-
Provided
Modes: Constant
Height Mode, Constant Current Mode, Distance Spectroscopy Of The
Tunneling, Tunneling Voltage Spectroscopy, dI/dU Spectroscopy
-
Computer
with PCI Board Based SPM Controller
-
Anfatec
Scan & Anfatec Present
-
19
“ STM Controller (Extra Low Noise 24 Bit Converters)
-
HV
Display For z-Direction
-
High
Voltage Amplifiers For The X-Y-Tube Scanning
-
Optional:
PC Controlled bi-Potentiostat And Electrochemical Cell
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- UHV High-Pressure Reactor
for: APMOCVD, LPMOCVD, ALD, CBE for Organic, Biology, BioOrganic Semiconductors,
NanoTechnology, BioOrganic Surface Chemistry
- Plasma Generators, MetalOrganic
-Sources, NanoJet - Nano-Particle Liquid Injector, Plasma Ion Source,
Magnetic Field Application, Plasma Generators with Controlled Gas Inlet
Systems and ALD fast-acting high temperature operation pneumatic valves,
Laser Viewports for Laser Heating, Abrasion Deposition (PLD), Brewster
and Glancing Angle Measurements, Optical Growth Diagnosis
- RGA Residual Gas Analysis,
differentially-pumped RHEED Gun including shutter-protected RHEED Screen,
Temperature and Growth Monitors, Flux Measurements and Quartz-Crystal
Microbalance.
- UHV Technology, Bakeout,
oilf-free vacuum system
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-
Highest
ESCA Performance and Energy Resoultion
-
VT-AFM/STM
with Atomic Resolution
-
Monochromatic
X-ray Source with High Count Rates
-
UHV Radial
Sample Distribution System
-
Sample
Preparation and Materials Deposition Chambers
-
Multi-Technique
Capabilities
-
Heatable/Coolable
Sample Manipulator
-
UHV System
with Excellent Basic Vacuum
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- UHV Heating Systems for
Wafers up to 12" in diameter
- Heating of Wafer in Load
Lock or Sample Treatment Chamber, Semiconductor Production
- Ultra-Fast Heating Ramps,
Automated Heating Operation
- Heating in Controlled
Atmospheres (O, N, NO etc) from UHV to 1000 mbar, Mass Flow Controller
Regulated
- Quartz Heaters with Uniform
Heating Performance
- Integrated Water Cooling
Jacket
- Quartz Lamps easily replaceable
- Thermocouple: Type K/C
- Power Supply and PID-Controller
- Laser Heating System
Optional
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- UHV Single-/Multi-Pocket
E-Beam Evaportor for Si/Ge Deposition
- Electron emitter is
designed with 270° beam deflection
- Horizontal or Vertical
Mounting and Evaporation
- High Voltage/High Current
Power Supply with Stable Output
- Thermocouple and PID-Controller
- Magnetic Shielding,
No Cross-Over
- Manual/Electrical/Pneumatical
Shutter System
- Integrated Water-Cooling
Shroud
- Quartz Crystal Microbalance
Option
- for Semiconductor,
MBE, PVD, Optical, Deposition-Applications
- UHV Design and Performance
to UHV Specifications
- Copper Hearth Evaporators
up to 50 cc Capacity.
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- Up to 500º C High
Temperature HV/UHV Crystal Sensor System for MBE, ALD, CVD, PVD, OLED,
etc.
- Eliminates Thickness
Measurement Errors Caused by Temperature Shifting of the Crystal Resonance
Frequency
- Diminishes Rate Measurement
Instability, Largely Caused by the Buildup of Film Stresses
- Matching of the Crystal
Temperature to the Substrate Temperature
- Super Quartz™ Gallium
Phosphate (GaPO4) QCMs
- Quartz Crystal Film Thickness
Monitor/Controller Included
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- Extremely Hard Coating
(Like Diamond)
- DLC Coatings Deposited
on Almost any Vacuum Stable Substrate
- Providing an Extremely
Smooth Surface that Reduces Friction and Protects Against Wear and
Corrosion
- Applications: Medical
Instruments, Tool Coatings, Drill Bits, Automotive Parts, IPOD®
Cases, EMI/RFI Shielding
- Fully Automated, Fast
Turn-Around Production Cycles
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- Spin Polarized Emitter:
GaAs, Zn doped with Cs, O2 Activation
- IR light source: 30 mW
Diode Laser,780 nm with circular polarizer and focusing lenses
- Polarization Rotation
in Condensors: 180 deg.
- Polarization Rotation
in Sector Field: 0..90 deg. vs. Beam Axis, in Sector Plane
- IR Light Source: 30 mW
Diode Laser,780 nm with Circular Polarizer and Focusing Lenses
- Degree of Spin Polarization:
27%
- Typical Emission Current:
1 µA
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-
Power
Supply For The STM Preamplifier
-
HV
Supply For The Scanner
-
Data
Connection To The PC Board AMU2.x That Acquires The Data
-
Control
For The DC Motor
-
8
x 24-Bit D/A Converters (4 Used For The Standard STM)
-
8
x 24-Bit A/D Converters (1 Used For The Standard STM)
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- Multifunctional
Leak Detector
- Wide
Range Pressure Mass Analyser,
- System
for Thermal Desorption Spectroscopy (TDS)
- Simultaneous Mass Analysis
for 10 Gases
- Intuitive and User Friendly
Operation
- Small Size, Low Weight
and Silent Operation
- Fully Computer Controlled
through USB-Interface
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-
WAFER
PROFILER CVP21for Group IV-, III-V-, Ternary III-V- , Quaternary
III-V-, Nitrides and II-VI- Semiconductors
-
ECV
Profiling is a Valuable Tool for Semiconductor Analysis; it is superior
over Hall, SIMS (Secondary Ion Mass Spectroscopy) and SRP (Sheet
Resistance Profiling)
-
Substrate
Size up to 8 inch (Conductive or Insulating)
-
Easy-to-use
and Calibration Free Operation!
-
Full
Automatic 'Dry in – Dry out' Sample Processing
-
Measurement
of Doping 'n and p' (Al,In)GaN or AlInN due to Etch Algorithms Producing
Fast Mirror-Like Etchings
-
Measurements
of Concentrations below 1014 cm-3
-
Evaluation
of Photo-Electro-Chemical (PEC) Etching
-
Determination
of Thickness of the Epi Layer
-
Fully
Automated Operation with Wafer Stepping and CCD-Camera Process Control
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- High Reflective Mirrors:
Reflectivity greater than 99.5%
- Optical Windows: with
Transmission greater than 99.5%
- Multi Function Components:
Optical Windows, Patterned Beamsplitters,
Polarizers, Waveplates, Combination Mirrors, Optical Materials,
Laser Crystals
- Prisms: with Antireflective
Coating, Reflective Hypotenuse
- Etalons: Analytical and
Telecommunication
- Patterned Beam Splitters:
Multilayer Dielectric and Metallic
- Dicing, Fiber Polishing
(Flat, Angled, and Radius FP-spec)
- Coatings for Wavelengths
from 180 nm to 2.5 Microns, including Antireflective, Metallic and Multi-Layer
Dielectric Reflectors
- Substrates: Fused Silica,
BK-7, Silicon, and Specialty Glass
- Ion Beam Assisted PVD
Coating Processes
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 New
Technical Online Support, Training and Maintenance Tool for Scientific
Instumentation - Easy
PC Implementation, Low Bandwidth Requirements, Direct Video and Audio
Access
- Enables
Full Remote Control of Customer System
- System
Failure Diagnosis Program
- Easy
Integration Into Any Existing System
- Reduces
Support Costs and Increases the Overall Customer Satisfaction
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- High Power (1.7kW), Non
Contact, Flash Vaporizer
- Delivery System For Solid
And Liquid Precursors
- For Research & Development,
Pilot Production and Production.
- Processes addressed:
MOCVD, batch ALD, PECVD, in line industrial CVD, All CVD And All Gas-Phase
Processes With One Or Two Liquid Inlets
- Efficiently Vaporization
of Low Vapour Pressure Solids Solved In Organic Solvents And Few Tens
Of g/min Of Liquids Such As TEOS
- Temperature Range up
to 300º C
- 3 Heating Zones - 3 Thermocouples
- 3 PID Controllers
- Automated Operation,
Computer Interface
- Power Control Unit (PCU)
for Heating Control
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-
SpecMaster:
Digital XPS Data-Base Systems, designed to be a practical tool for
everyday use
-
Library
of >40,000 reference spectra; 8,500+ Reference spectra; 32,000+
Practical Studies
-
Spectral
Data Processor: Advanced Data Processing Software for XPS and AES
spectra
-
Handbooks
of Monochromatic XPS Spectra for Elements, Native, Binary and Rare
Earth Oxides, Polymers, Semiconductors, Nitrides, Carbonates etc.
-
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- Aberration Corrected
LEEM / PEEM with calculated resolution <3 nm at 8 times more intensity!
- ELMITEC LEEM IV: Electrostatic
Flange-On LEEM with Magnetic Beam Splitter
- ELMITEC LEEM V with 90°
Sectorfield, achieved resolution: 4.9 nm
- ELMITEC PEEM III with
best achieved resolution: 8.2 nm
- ELMITEC PEEMSpector:
new, small, fully electrostatic photoelectron microscope.
- Imaging Energy Analyzer
with Energy Resolution: <0.2eV
- Spin Polarized Electron
Source with Spin Manipulator
- High Precision and High
Stability Sample Manipulators
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- Scanning Probe Microscopes,
Scanning Tunneling Microscopes, Atomic Force Microscopes, from ANFATEC
- AFM with: NonContact-AFM,
CM, LFM, MFM, dynamic EFM, Kelvin Probe Force Microscopy, Mixed Frequency
Detection, Conduction AFM
- Golden STM for Solids/Liquids,
with dI/dV spectroscopy, including etching tool for tungsten tips
- Universal SPM Controller
with WINDOWS-based SPM software, fully digital system control
- Fully digital HF-LockIn
Amplifier, Quad Channel, Oscilloscope, Spectrum Analyzer
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Manipulators,
Goniometers and Mechanical Feedthroughs:
- UHV Vacuum Sample Manipulators
- XY-, XYZ-Manipulators,
4-,5-, 6-Axis Manipulators,
- Z-Motion Device, Sample
Transfer Systems
- Sample Cooling and Sample
Heating, Sample Heating Power Supplies
- Stepper Motors, Motorized
Motions, UHV Goniometers
- Rotary Feedthroughs,
Differentially Pumped Rotary Feedthroughs, Linear Feedthroughs
- Wobble Sticks with Gripping
and Rotating Tip
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- ALD Reactor Batch Tool
for Industrial and R&D Applications
- Applications: Optical
Filters and Films, Semiconductor and Compound Semiconductors, Dielectric
Layers, Diffusion Barriers and Passivation Layers, NanoTechnology,
MEMS, Organic Deposition
- Universal Precursor
Delivery System: Gases, Liquids, Solids
- Very High Film Uniformity,
Homogeneity, and Density; Atomic Level Control
- Multi-Reactor Systems
with complete Vacuum Pumping Facilities, Gas Purging, Fully Computer
Controlled Operation PLC with PC Interface
- Maximum Temperature
up to 550°C, Deposition Pressure <20mbar
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- for Biology, Medicine,
MEMS, Semiconductor, Photonics, Fiber Optics, Microelectronics
- RoboMate NanoRoboter
with Angular/Linear Motorised Positioning System
- Piezo Motor Driven NanoStages
and Linear Transfer Devices with NanoResolution over Large Travel Range
up to 100mm!
- Software Driven NanoMotion
with Full Digital DSP Control enabling NanoSmoothness
- Virtual Point Technology
for NanoPositioning at Indefinetively Variable Angles
- Resolution 0.4 nm, Angular
Resolution 0.5 arc/sec
- Long Term Stability less
than 2nm/hour drift at 20°C
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- for Biology, MALDI-TOF-MS,
BioOrganic Semiconductors, NanoTechnology, BioOrganic Surface Chemistry
- High-Intensity Beams
for Beam-Surface Reaction and Time-Resolved Reaction Experiments
- Macro-Molecular Beam
Injector for Collimated, Scanable, High Flux Molecular Beam (Organic
Molecules, DNA) with well Controlled Parameters
- Electro-Spray Inlet
System with High Intensity Beam Ion Source
- UHV System with Multi-Stage
Differential Pumping System for UVH Compatible Beam Conditions
- Beam Control/Modulation
with Shutter and Optical Chopper (0 to 200 Hz)
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- for Fully Automated
GC/MS, LC/MS and CE/MS Applications
- Combines all advantages
of magnetic sector, time of flight and quadrupole technologies
- Unique Combination
of Ionization Techniques results in outstanding features
- Parallel Multi Channel
Detection System for FasT Scan Speed and Highest Mass Resolution
- Compact Double Focussing
Magnetic Sector Analyzer applying Mattauch-Herzog Ion Optical Geometry
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- Three Dimensional Analysis
of Semiconductors and Thin Film Structures
- Combination of a DC Electrostatic
Field Coupled with Femto-Second Laser Pulses
- Ultimate Mass Resolution
through Laser Assisted Desorption
- Routine Mass Analysis
of Complex Structures for Rapid Sample Characterization
- Sample
Courtesy of Professor Alfred Cerezo, Oxford University
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- IR-, SXR-, X-Ray, VUV-Beamlines,
X-ray Microscope, Goniometers
- Scanning Grating Monochromator
(SGM), Soft-X-Ray Monochromators
- Mirror Bending Systems
with Double-Crystal Monochromator, IR-Mirrors
- UHV Crystal Spectrometers,
IR Endoscope, Boundary Layer Spectrometer (BLS)
- Endstations, Beam and
Current Monitors, Bakeout Equipment, Process Control
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- UHV Sputter Processing
and Thin Film Deposition System
- Research and Production
Applications
- Magnetron Sputter Cathode
Assembly with DC-, Pulsed-DC, RF Power,
- Magnetic or NonMagnetic
Materials, Reactive Sputtering
-
2-, 3-,
4- UHV Sputter Targets with Optimized Magnet System
- Processing Gas Supply
with Mass Flow Control System
-
Automatic
System Control for Multiple Wafer Deposition
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-
-
Precise
monitoring and growth control of thin films in OLED applications
-
Complete
Vacuum System for Organics, Polymers and Biomaterials
-
-
Automatic
System Control for Multiple Wafer Deposition
-
Very
accurate beam flux control through fuzzy logic control loop
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- Excimer Based Pulsed
Laser System for UHV Deposition from Various Targets
- Automatic Target Scanning,
Sample Preparation and Transfer System
- High Oxygen Resistance
Substrate Heaters and Components
- Excellent Thin Film Uniformity
and Temperature Homogenity
- Laser Beam Line, including
Optical Train with Mirror and Focussing Lens
- Complete UHV Systems
with In-Situ Diagnostics, RHEED, Ellipsometry, Pyrometry
- Manual or Automated Operation,
Fully Computer Controlled System
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- Precise monitoring and
growth control of thin films in MBE applications
- Multitasking technology
for independent parallel measurements
- High Performance, low-light
near-infrared CCD-camera
- Sophisticated data processing
software for RHEED oscillations
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- Unique Materials Selection
from Aluminium to Zirconium
- Evaporation Source and
Crucible Recommendation
- Melting Point and Temperature
(°C) for Vapor Pressure in Torr
- Full Elemental Information
with Chemical Symbol
- for MBE and UHV Deposition
Applications
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-
-
Process
Control, Quality Assurance, Indoor Air Monitorig, Fire Detection
-
Micro-Design
with Karlsruhe Micronose KAMNIA Chip
-
Compact
Electronic Detector based on a Gradient Micro Array Concept
-
Universally
Integrable Gas Analytical Tool for Household and Industry
-
Immediate
Characterizing of Chemical State
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