Scientific

ELMITEC Direct imaging Ultra High Vacuum surface microscope model PEEM III

ELMITEC PEEM III System Specifications:

• Imaging modes: Thermionic- and Photo-emission Microscopy.
• Spectroscopic imaging with energy analyser.
• Resolution: guaranteed <15 nm, best achieved 8.2 nm (16/84% criteria)
• Field of view: 2 - 150 µm,
• Base pressure: < 2 x 10-10 Torr
• Sample temperature: room temperature to 1800K (short time flashes up to 2000K are possible)
  

SPEPEEM - PEEM III with Imaging Energy Analyzer	Spin Polarized Electron Gun

ELMITEC PEEM III System Description:

• Magnetic objective lens with deflectors and stigmator
• UHV specimen chamber with flanges for specimen transfer system, 8 2¾" conflat flanges pointing directly forwards the sample surface for connection of a UV-short-arc-lamp (for PEEM), evaporators and other equipment, 7 further 2¾" conflat flanges for viewports, gas inlet etc.
• Specimenmanipulator: 3 translations (±4 mm for X,Y and 50mm travel along manipulator axis) and 2 eucentric tilts ±2°, exchangeable sample cartridge with electron bombardment heating, W/Re-thermocouple
• Imaging system consisting of 5 magnetic lenses, 4 deflectors, 2 stigmators, 1 contrast aperture manipulator with three apertures and a chevron channel plate array with a fluorescent screen
• High resolution CCD camera with extensive control and image processing software
• Adjustable photo emission light source
• Power supplies, computer and control software for all electron optical elements (lenses, deflectors, stigmators)
• Ultra high vacuum system consisting of 2 ion getter pumps, 1 turbo-molecular pump, oil-free foreline pump, 2 Ti-sublimation pumps, bakeable valves and 2 UHV-ion-gauges, 1 thermocouple gauge, bakeout heaters and bakeout tent.
• One standard metal evaporator
• Options: Preparation chamber, Mass Spectrometer, Ion sputtering gun in preparation chamber.
  
  The version PEEM III can be supplemented later by an energy analyzer for spectroscopic imaging.
  

  Application examples:
  

Field of view 10µm. The image is taken in real time (50 Frames/sec.) Light source: 100W Mercury Lab Source	PEEM image of etched pits in a Si(001) wafer. The field of view is 140 microns. By the courtesy of Dr. Gary Kellogg, Sandia National Laboratories Albuquerque, New Mexico